Park Systems Introduces the NX1 Atomic Force Microscope
Introduction
Park Systems Corp., a global leader in Atomic Force Microscopy (AFM) solutions, has announced the launch of the NX1, a compact and powerful AFM capable of atomic-scale imaging in ambient conditions. This groundbreaking technology, developed in collaboration with Professor Franz J. Giessibl from the University of Regensburg, defies traditional boundaries by allowing researchers to easily achieve resolutions previously limited to ultra-high vacuum environments.
The Development Journey
The NX1 is built upon the Orpheus II prototype, which was developed by Professor Giessibl’s research group. This model showcased the viability of atomic-scale imaging under ambient conditions. Park Systems transformed this innovative concept into a commercially viable product, combining the proven architecture of Orpheus II with precision manufacturing and the reliability of Park Systems’ expertise in AFM engineering. As a result, the NX1 achieves a background noise level that is an order of magnitude lower than conventional AFM systems, making high-quality atomic imaging accessible in everyday labs.
What Sets the NX1 Apart?
Dr. Sang-Joon Cho, Executive Vice President and Head of the Research Equipment Division at Park Systems, highlighted, "The NX1 is a product of combining Professor Giessibl's pioneering research with Park Systems’ proven capabilities to commercialize the world’s most advanced science." This collaboration has resulted in an incredibly reliable, user-friendly tool that is accessible to scientists worldwide, poised to create new markets in the field of nanotechnology.
The NX1 is designed to not only perform at the highest levels but also to be utilized on a daily basis. It is compatible with standard silicon cantilevers as well as an optional qPlus sensor that allows for oscillation amplitudes measured in picometers and exceptional sensitivity to short-range forces. The probe change process is simplified with a pre-aligned kinematic chip holder system, and there’s an integrated optical microscope on-axis that enables direct visualization of the probe and sample during operation. Moreover, the system is fully compatible with Park Systems' SmartScan™ operating software and SmartAnalysis™ image analysis platform.
Expert Insights
Professor Franz J. Giessibl noted the significance of the NX1, stating, "While Orpheus II proved the concept, it was merely a research tool meant for experts. Park Systems’ expertise has been crucial in transforming it into a reliable product usable by the broader scientific community. The NX1 is what the original idea always had the potential to become."
Availability
The NX1 is now available for order. For technical specifications and application data, visit
Park Systems' official website.
About Park Systems
Park Systems is a global leader in nanometrology, providing advanced measurement solutions for research and industrial applications. With regional offices in America, Europe, and Asia, the company supports clients across semiconductor manufacturing, materials science, and nanotechnology research. Its technological portfolio includes Atomic Force Microscopy (AFM), imaging spectroscopic ellipsometry, digital holographic microscopy, white-light interferometry, and active vibration isolation systems. Founded by Dr. Sang-il Park, who contributed to the invention of AFM at Stanford University, Park Systems continues to grow through ongoing innovation and strategic acquisitions, including Accurion GmbH and Lyncée Tec SA, establishing itself as a leader in the global nanometrology industry.
For more information, please visit
www.parksystems.com.