#EUV Lithography #Imec #Nanopores

Breakthrough in Solid-State Nanopores

In a significant advancement for semiconductor technology, Imec, a leading research center in Leuven, Belgium, announced the successful wafer-scale fabrication of solid-state nanopores utilizing extreme ultraviolet (EUV) lithography. This pioneering achievement represents a historic transition from laboratory-scale concept to a scalable platform apt for various applications, including biosensors, genomics, and proteomics.

The Potential of Nanopores

Nanopores have been recognized as pivotal components in genomics and proteomics due to their ability to facilitate the analysis of biomolecules. Prior to Imec's breakthrough, the mass production of solid-state nanopores faced challenges due to variability and integration issues. This new development opens avenues for high-performing biosensing applications compatible with CMOS technology, which could expedite progress toward personalized medicine, rapid diagnostics, and molecular data storage.

Key Features of the New Fabrication Process

The wafer-scale production achieved by Imec has resulted in nanopores approximately 10 nm in size, featuring remarkable uniformity across a 300 mm semiconductor wafer. Furthermore, future enhancements to the process could potentially allow for the creation of pores smaller than 5 nm. The process has exhibited an impressive electrical characterization, achieving a signal-to-noise ratio of 6.2, a critical factor in biomolecular detection and analysis.

Unique Capabilities of Imec

Ashesh Ray Chaudhuri, the project manager and first author of the research, remarked on Imec's unique position to make this leap.