#USA #Axcelis Technologies #Semiconductor Industry #Beverly #Purion H6

Axcelis Technologies Introduces the Purion H6

Axcelis Technologies, Inc., a premier provider of ion implantation solutions for the semiconductor sector, has announced its latest innovation: the Purion H6 high current ion implanter. This groundbreaking technology is engineered to fulfill the growing demands of next-generation semiconductor devices by offering unparalleled purity, precision, and productivity.

Advancements Over Previous Models

The Purion H6 builds on the success of Axcelis's established Purion H product line, integrating cutting-edge technologies to address contemporary device manufacturing needs. Notably, the new design incorporates an advanced beamline that elevates throughput while innovating in source life, particle control, and dosimetry. This advancement assures customers benefit from a high-quality ion beam that optimizes usability, minimizes ownership costs, and enhances system reliability.

Key Features:

• - Next Generation Dose Control: Improved repeatability ensures wafer safety and lowers operational expenses.
• - Enhanced Particle Control: Crafted beamline significantly reduces contamination, boosting yield while minimizing maintenance costs and frequencies.
• - Eterna™ ELS7 Source Technology: This feature enhances beam stability and repeatability while decreasing required maintenance time and increasing source longevity.
• - Best in Class Productivity: By providing superior beam currents in its category, it aids in achieving industry-leading throughput levels.

Leadership Insights

Dr. Russell Low, Axcelis's President and CEO, expressed excitement about the Purion H6, emphasizing it is tailored to tackle customers' advanced semiconductor manufacturing challenges. The company's commitment lies in driving process performance and minimizing costs of ownership, essential for significant advancements in logic, advanced memory, image sensors, and mature technology markets.

Executive Vice President, Dr. Greg Redinbo, noted that the new system was designed in close collaboration with clients, establishing benchmarks in implant purity, precision, and productivity. The innovations introduced, such as the new dose control technology and enhanced beamline optimization, permit extraordinary implant process control while ensuring capital efficiency and productivity.

Upcoming Revelations

For those interested in seeing the Purion H6 in action, Axcelis will showcase this system alongside other innovative ion implantation solutions at the SEMICON Korea exhibition, taking place from February 11-13 at COEX in Seoul, South Korea. Visitors will have the opportunity to experience firsthand how this next-generation system could impact the semiconductor landscape.

About Axcelis

Founded over 45 years ago and headquartered in Beverly, Massachusetts, Axcelis is known for its innovative, high-productivity solutions for the semiconductor industry. The company focuses on developing ion implantation systems, a critical step in integrated circuit manufacturing, ensuring comprehensive lifecycle support to its customers. To find out more about their promising solutions, visit Axcelis's website.

In conclusion, the introduction of the Purion H6 could mark a turning point in the semiconductor manufacturing process, enhancing productivity and performance essential for the future of high-tech devices. With its innovative features and improved efficiency, it is poised to become an indispensable tool in the semiconductor arsenal.