#Japan #Holon #Tachikawa #Photomask #SEM Technology

Holon Presents Revolutionary Photomask Defect Correction Technology

Holon, a consolidated subsidiary based in Tachikawa, Tokyo, has recently announced significant advancements in photomask defect correction technology. This was showcased at the SPIE Photomask Technology + Extreme Ultraviolet Lithography 2026 international conference held in Monterey, California from September 8 to 11, 2026. The company, led by CEO Zhang Hao, presented their findings utilizing aberration-corrected Scanning Electron Microscopy (SEM) to address various performance evaluations in photomask defect correction.

During the presentation, Holon reported on practical findings that confirm the effectiveness of the developed technology. The team has been working on an innovative device that incorporates a SEM column equipped with aberration correction features, a project that leverages their extensive expertise in electron optics gained from working with Critical Dimension Scanning Electron Microscopes (CD-SEM). This adds value to the ongoing development efforts of correcting photomask defects, which are crucial for the semiconductor fabrication process.

In recent years, the demand for high-precision defect correction technologies has surged, primarily due to the growing adoption of curvilinear patterns aimed at enhancing lithography performance. The ability to achieve higher correction precision and fidelity in shapes has become more critical than ever. The conference provided an ideal platform for Holon to highlight their contribution towards increasing photomask yield, an essential aspect for the semiconductor industry's overall advancement.

Holon aims to continue enhancing electronic beam application technologies, striving to create new values within the semiconductor field. Current and future endeavors will focus on applying these solutions across various application areas including HDD, MEMS, and nano-imprinting, where precise measurements and defect reviews are vital.

To learn more about the research findings presented at the conference, additional details are available on Holon's official website in the latest press release: Holon Press Release.

About Holon

Holon specializes in providing dimension measurement and defect review technologies within the semiconductor and nanotechnology sectors, capitalizing on electron beam technology. Leveraging extensive know-how from observation and measurement of photomasks, Holon has developed and sold equipment for ultra-fine processing applications. The company continues to make strides in developing advanced solutions that cater to the fast-evolving demands of the semiconductor industry.

For media inquiries, please contact:
A&D Holon Holdings
Public Relations & IR Division: +81-3-5391-6124