Introduction
SK keyfoundry has recently unveiled a groundbreaking technology in the semiconductor industry: the Multi-Level Thick IMD (Inter-Metal Dielectric) process. This new approach promises significant advancements in capacitor performance, particularly within the automotive sector. By introducing this innovation, SK keyfoundry aims to enhance the reliability and longevity of semiconductor devices, making them more efficient and safe for various applications.
Multi-Level Thick IMD Process Overview
The core feature of the new Multi-Level Thick IMD process is its ability to support up to three inter-metal dielectric layers, each reaching a maximum thickness of 6μm. This results in a total dielectric thickness of up to 18μm when combined in a metal-insulator-metal (MIM) structure. Notably, this configuration achieves high breakdown voltage characteristics, rated as high as 19,000V, enabling capacitors manufactured with this process to perform exceptionally well in terms of capacitance.
The design of the capacitors using this process not only meets but exceeds the rigorous demands of high voltage applications, particularly in digital isolation and reducing capacitive coupling within electronic circuits. This advancement is crucial for applications where reliability is imperative, such as in electric vehicles (EVs), telecommunications, and healthcare devices.
Robust Performance and Reliability
The capacitors created through this new method have been subjected to extensive evaluations, successfully passing Time Dependent Dielectric Breakdown (TDDB) tests from major clients. Furthermore, they meet the AEC-Q100 international automotive semiconductor quality standards, indicating strong performance even in harsh environments, which is particularly relevant for automotive applications.
This process seamlessly integrates with 0.13µm and 0.18µm BCD (Bipolar-CMOS-DMOS) technologies, further expanding its applicability in the automotive semiconductor domain. The strong performance metrics and adaptability of this technology signify its potential to set new benchmarks within the industry.
Tools and Support for Clients
To facilitate swift product development for its customers, SK keyfoundry has also provided comprehensive design support tools. These include a Process Design Kit (PDK), Design Rule Check (DRC), Layout Parasitic Extraction (LPE), Layout Versus Schematic (LVS), and Pcell. These resources empower semiconductor designers to leverage the advantages of the Multi-Level Thick IMD process effectively and efficiently.
Competitive Advantage in the Market
Derek D. Lee, the CEO of SK keyfoundry, highlighted that this innovative technology offers a significant competitive edge, particularly in sectors requiring high noise immunity, such as electric vehicles, industrial applications, telecommunication systems, and healthcare technologies. This new process is designed to outperform traditional optical isolators, showcasing not only better reliability and integration but also cost-effectiveness.
Conclusion
As SK keyfoundry continues to innovate in the semiconductor foundry space, it reaffirms its commitment to providing world-class technology solutions to both domestic and international markets. With a track record of successful mass production, SK keyfoundry is well-positioned to cater to the evolving needs of clients across the globe, including markets in the United States, China, and Taiwan. This latest product launch will undoubtedly mark a pivotal point in the industry, particularly for applications demanding high performance and reliability.
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