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Park Systems Launches New Joint Development Program for Advanced Metrology

In a significant development, Park Systems, a world leader in atomic force microscopy (AFM) and nanoscale metrology, has announced the initiation of a new Joint Development Program (JDP) aimed at advancing metrology solutions for cutting-edge semiconductor packaging and logic processes. This strategic collaboration with imec, a leading research center in Belgium known for its work in advanced semiconductor technologies, signifies a major leap forward for both entities in addressing the complexities of modern semiconductor manufacturing.

Meeting the Demands of Semiconductor Complexity

The growing complexity of semiconductor manufacturing presents significant challenges, particularly in the realm of metrology. Dr. Sang-il Park, founder and CEO of Park Systems, emphasized the escalating demands this new era places on measurement technologies. “The semiconductor manufacturing industry is evolving, necessitating enhanced metrology solutions to keep pace with these developments,” he stated. This collaboration aims to deploy a comprehensive suite of Park Systems’ metrology tools, including AFM, white light interferometry (WLI), imaging spectroscopic ellipsometry (ISE), and digital holographic microscopy (DHM).

Partnership with imec

Imec's state-of-the-art facility operates as a global research hub for semiconductor technologies, fostering collaboration across the semiconductor ecosystem. As part of the JDP, imec will supply samples aligned with next-generation packaging and logic roadmaps. This initiative underscores the urgency of refining metrology practices as the semiconductor fabrication landscape becomes increasingly intricate.

Philippe Leray, imec's Vice President of R&D for Patterning, commented on how future semiconductor architectures and materials introduce significant integration challenges. “Addressing these challenges will require the innovative and synergistic integration of various technologies. Our partnership with Park Systems aims to demonstrate how their advanced capabilities can support the roadmap for future semiconductor technology,” he remarked.

Aims and Scope of the Program

The scope of the new JDP reflects both the increasing demands of semiconductor manufacturing and Park Systems' expanding metrology portfolio. This collaboration also includes participation in imec’s Industrial Affiliation Program (IIAP), specializing in 3D System Integration, with the program set to span two years.

This JDP marks a key milestone for Park Systems, coinciding with the recent inauguration of its new global headquarters in Gwacheon, South Korea. This state-of-the-art facility is designed to enhance the company’s capabilities and further explore collaborative opportunities in semiconductor metrology.

About Park Systems

Founded by Dr. Sang-il Park, who contributed to the invention of atomic force microscopy, Park Systems has grown into a global reference in nanometrology through continuous innovation and strategic acquisitions. Their advanced metrology solutions are widely used across the semiconductor manufacturing industry, materials science, and nanotechnology research. With regional offices in America, Europe, and Asia, Park Systems is well-positioned to support its clients in tackling the advanced challenges of modern technology.

For further information about their offerings, visit www.parksystems.com.