Introducing the World's First Hydrodynamic Liquid Particle Counter PT-01F for Enhanced Particle Property Estimation

The Launch of the World's First Hydrodynamic Liquid Particle Counter PT-01F

RION Inc. (headquartered in Kokubunji, Tokyo, CEO: Katsuaki Kato) has announced the launch of the PT-01F, the world’s first hydrodynamic liquid particle counter, scheduled for release on April 10, 2026. This innovative device is developed in collaboration with the National Institute of Advanced Industrial Science and Technology (AIST) and KIOXIA Corporation. Utilizing the Flow Particle Tracking method (FPT), this groundbreaking product offers an advanced solution for estimating particle properties within flowing liquids.

Revolutionizing Particle Measurement

The PT-01F represents a significant evolution from traditional light scattering-based liquid particle counters (LPC). By leveraging RION’s long-standing expertise in light scattering technology combined with the revolutionary FPT method, the PT-01F can accurately measure the size, quantity, and refractive index of fine particles within a liquid stream. This cuts-edge technology tracks and analyzes Brownian motion to derive particle diameters closely aligned with geometric dimensions while estimating refractive indices simultaneously from the same particles’ scattered light intensity.

Such capabilities are critical in ensuring quality control in the semiconductor manufacturing process, particularly in monitoring ultra-pure water and chemical solutions which play pivotal roles in operational efficiency and yield improvement. The ability to identify the origins of yield deterioration is now supported by precise and real-time integration of particle property data.

Addressing Industry Challenges

As the semiconductor industry seeks ways to enhance yield rates and operational uptime, there is an increasing demand for detailed particle characterization that goes beyond merely counting particles. The ability to discern information regarding the composition of materials like bubbles, fluororesin, and metals can significantly aid in diagnosing defects and equipment failures. Consequently, a solution that can continuously and accurately measure real-time information about particle size and number is now necessary.

Development Background

The PT-01F was developed under the auspices of the New Energy and Industrial Technology Development Organization (NEDO) as part of a project on ‘Foundational Technologies for Nanodefect Management.’ This project, executed in collaboration with Toshiba Corporation, demonstrated the feasibility of simultaneously measuring geometric diameters and physical property information of solid particles in a flow field at the International Symposium on Semiconductor Manufacturing in 2018.

From 2016 to 2018, RION, AIST, and Toshiba Memory Corporation (now KIOXIA) engaged in joint device development with evaluations conducted across 16 domestic manufacturers to validate the technology prior to product launch.

Key Features

The PT-01F integrates the following features to assist in effective particle management:

- Real-Time Inline Measurements: The ability to track and analyze Brownian motion allows for real-time, inline measurements directly within the flow field.
- Simultaneous Measurement: The device measures particle number density distributions based on geometric diameter and concurrently calculates refractive indices, providing critical data on particle properties.
- Refractive Index Mapping: It displays frequency distribution maps in the context of refractive index versus particle size, simplifying analysis.
- Wide Measurement Range: Capable of measuring particles ranging from 30 nm to 100 nm with refractive indices from 1.0 to 2.6, accommodating a variety of non-light-absorbing particles.
- Instantaneous Analysis: Results are displayed in real-time, enabling immediate decision-making.
- Chemical Resistance: The device’s wetted parts are made from chemically resistant materials, allowing for a broad spectrum of chemical measurements.

Primary Applications

- Particle management in ultra-pure water and chemical solutions during semiconductor manufacturing.
- Evaluation of washing processes for wafers and components.

Further technical details regarding the PT-01F will soon be available on RION's website. Notably, this product has been developed specifically for the domestic market and is not available for purchase or support overseas.

For more information:

Media Inquiries:
RION Inc.: IR Public Relations Division, Okabe and Shigekawa
Tel: 042-359-7830

Product Inquiries:
RION Inc.: Fine Particle Measurement Division
Tel: 042-359-7878